Which of the following is false?
Contact mode lithography gives better resolution than other two modes
In contact mode lithography the mask may get contaminated by photoresist.
Effect of diffraction of light is minimum for contact mode lithography.
Contact mode lithography is not efficient for batch production.
To find the false statement among the given options, let's analyze each option one by one.
1. "Contact mode lithography gives better resolution than other two modes."
To verify this statement, we need to know what the other two modes are. Unfortunately, the other two modes are not provided in the question, so we cannot determine the accuracy of this statement.
2. "In contact mode lithography, the mask may get contaminated by photoresist."
This statement is true. In contact mode lithography, the mask is in direct contact with the photoresist, which can result in the transfer of contamination from the photoresist to the mask.
3. "Effect of diffraction of light is minimum for contact mode lithography."
This statement is also true. In contact mode lithography, since the mask and the photoresist are in direct contact, the distance between them is small, reducing the diffraction effects of light. This leads to a higher resolution compared to other lithography modes.
4. "Contact mode lithography is not efficient for batch production."
This statement is true. Contact mode lithography involves direct contact between the mask and the photoresist, which can lead to wear and tear on the mask. This limits its efficiency for batch production where multiple exposures are required.
Based on the analysis, statement 1 cannot be determined, statements 2, 3, and 4 are true. Therefore, the false statement among the given options is statement 1.