Which of the following processes is used in order to fabricate mono-crystalline silicon?
a) The Czochralski process
b) Silicon ribbon process
c) The float-zone process
d) The silicon casting process
and c
a)
The majority of silicon crystals grown for device production are produced by the Czochralski process, (CZ-Si) since it is the cheapest method available and it is capable of producing large size crystals
http://en.wikipedia.org/wiki/Silicon
A & C
for pollysilicon but a and c for mono si
A and C correct answers
Thank you! but it's not only a) !!
b and d
B and D
To determine which process is used to fabricate mono-crystalline silicon, let's examine each process and find the one that fits the description.
a) The Czochralski process: This process involves melting polycrystalline silicon in a crucible and then slowly pulling a single crystal seed from the molten silicon. As the seed is pulled, the molten silicon solidifies around it, creating a mono-crystalline silicon ingot.
b) Silicon ribbon process: This process is used to produce multi-crystalline silicon, not mono-crystalline silicon. It involves growing a large ribbon of silicon by continuously pulling it from a bath of molten silicon.
c) The float-zone process: This process is commonly used for fabricating mono-crystalline silicon. In this method, a rod or seed of mono-crystalline silicon is passed through a region of molten silicon. The molten silicon freezes on the rod, creating a mono-crystalline ingot.
d) The silicon casting process: This process is used to produce multi-crystalline silicon ingots. It involves pouring molten silicon into a mold and allowing it to solidify into a multi-crystalline structure.
Based on the above information, the correct answer is:
c) The float-zone process is used to fabricate mono-crystalline silicon.