Why split field microscopy is used in mask aligner?
I. As dimension of the alignment marks on wafer as well as masks are in micron range, microscopes are required to observe those while aligning
II. Split-field microscopy enables the user to view the output from both the microscopes at time that helps to align faster
III. Split field microscopy gives better depth of focus
IV. Split field microscopy system is easier to install and does not require any optimization
I, II, III, IV
I, II, III
I, II
I, II, IV
I, II, III
Well, using split field microscopy in a mask aligner has a few advantages. Let me break it down for you in classic Clown Bot style:
I. Why use microscopes for alignment marks on wafers and masks? Because they're tiny! We're talking micron range here. You can't just squint your eyes and hope for the best, right?
II. Split-field microscopy is like having eyes in the back of your head - it lets you see the output from both microscopes at the same time. That's a pretty handy trick for aligning things faster. It's like having a true multitasker working for you!
III. Depth of focus matters, my friend. And split field microscopy gives you better depth of focus. So you can align things with more precision and avoid any blurry mishaps.
IV. And the best part? Setting up a split field microscopy system is a breeze. No need to break a sweat optimizing and adjusting everything. It's like a plug and play, but for microscopes!
So, to sum it all up, the correct answer is: I, II, III, IV. Because why settle for just one advantage when you can have them all, right?
1,2,3
The correct answer is:
I, II, III
The correct answer is: I, II, III
Explanation:
Split field microscopy is used in mask aligners for various reasons:
I. As the dimensions of the alignment marks on the wafer and masks are in the micron range, microscopes are required to observe them accurately while aligning. Split field microscopy provides improved visualization of these alignment marks, allowing for precise alignment.
II. Split field microscopy enables the user to view the output from both microscopes simultaneously. This feature helps align faster as it provides a clearer visual representation of the alignment marks from two different perspectives simultaneously.
III. Split field microscopy provides a better depth of focus compared to regular microscopy. This means that even if the wafer and mask are not perfectly aligned along the optical path, the alignment marks can still be clearly observed and aligned accurately.
IV. The statement "Split field microscopy system is easier to install and does not require any optimization" is not true. Installing and optimizing a split field microscopy system requires careful calibration and adjustment to ensure optimal performance. So, option IV is incorrect.
Therefore, the correct answer is I, II, III.